Cher Ming Tan,Feifei He's Electromigration Modeling at Circuit Layout Level PDF

By Cher Ming Tan,Feifei He

built-in circuit (IC) reliability is of accelerating drawback in present-day IC know-how the place the interconnect disasters considerably raises the failure price for ICs with lowering interconnect size and extending variety of interconnect degrees. Electromigration (EM) of interconnects has now turn into the dominant failure mechanism that determines the circuit reliability. This short addresses the readers to the need of 3D actual circuit modelling so that it will assessment the EM of interconnect process in ICs, and the way they could create such types for his or her personal functions. A three-d (3D) electro-thermo-structural version instead of the normal present density dependent 2-dimensional (2D) types is gifted at circuit-layout level.

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Electromigration Modeling at Circuit Layout Level (SpringerBriefs in Applied Sciences and Technology) by Cher Ming Tan,Feifei He


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